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Grinding oil, belonging to a grinding agent. It has the following characteristics: 1) High purity and low ion content; 2) Auxiliary coarse grinding or fine grinding makes the grinding end face more delicate and easier to polish; 3) Good product stability and long storage time. Monocrystalline Diamond Slurry Monocrystallina Diamond Slurry est nostra solutio efficacissima ad durum sinum, ut ceramic, ferrum, materiam metalli, cristallum opticum etc. fundatae sunt in promptu, late ad materias duras lambentes et processus adhibitas. Campus Applications: 1. Sapphirus substernitur stridor et expolitio; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Cadmiae selenide expolitio; Iphone6 camera lens lambens et poliens; capita rigida lambentia et poliuntur; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Metallum lapsu/molendum; aluminium stannum/stridor; fingunt lapping/molere; formare, polire; ceramic stridor/lapping; mobile phone testam/causa lapping; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 4. Pistorius Ring honing.

Explore Hans' precision grinding solutions for polished surfaces on metals, glass, and ceramics, enhancing your production quality. About Agrolinx Im paragr. Hic strepita ut textum tuum adde et me emendes. Praesent facilisis. Modo preme "Edere Text" vel geminus click me ut tuum contentus adde et fonti mutas facias. Locus magnus sum tibi ut fabulam narrem et utentes tui plusculum de te cognoscant.

High-precision colloidal silica polishing slurry for defect-free finishing on glass, optics, and precision surfaces. Compatible with flexible lapping films. Colloidal silica slurries Colloidales silicae slurriae fiunt ab alto puritatis pii pulveris per technologiam provectam. Late adhibentur pro scalis chemicis mechanicis ad nanometris poliendis in variis materiis, ut laganum pii, chymicum compositum, perspectiva exquisita, gemmae etc. Aliam quantitatem frumenti praebere possumus ut tuis requisitis occurram. Secundum diversum valorem PH, in genus acidicum et alcalinum dividi potest. Features 1. Maximum rate remotionem, silicae particulae magnitudinem adhibens, celeriter consummationem consequi potes; 2. Diversae particulae magnitudo petitioni tuae fieri potuit; 3. Alta puritas immunditiam in electrica productos minuere potest; 4. Princeps lenis processus, SiO2 particulae damnum in physica machinis non laedunt. Applicationem Connexiones opticorum fibra finalis finis.

High-performance polycrystalline diamond slurry for scratch-free, high-stock removal lapping of sapphire, optics, ceramics, and semiconductor materials. Polycrystalline Diamond Slurry Hans adamas slurriam expolitio comprehendit PCD, DND et MD series quae pluribus applicationibus diversis conveniet. Cum bono dispensabilitate, aequaliter particulae magnitudinis distributio, tam aqua quam oleum innixum praesto sunt, late pro duris materiis lambendo et dispensando adhibitis. Polycrystalline Diamond Slurry Nostrae popularis PCD slurry potest praebere altam stirpem remotionem ratem sine fricare, late ad usum laminis et processus sapphiri substrati, lentis optici, vitri duri, crystalli, ceramici, magnetici capita, disco duro et spumae CMOS etc.

Explore our high-performance abrasive polishing disc for versatile uses. Achieve precision and efficiency in grinding and polishing tasks. Film lambens Taps Home / Lima lapping politura Disc / Diamond Lapping Film Disc / Diamond-bead Polonica Tape facta est ex magnitudine globuli adamantis micron, quae ex multo minore quantitatis micron adamantino constat. Agit sicut lapis micron stridor in processu poliendo, et superficies lenis poliendo cum alto rate remotionis dat. In processu poliendo, globuli adamantis in particulas minores erumpunt, quae tamquam catenam poliunt et constantem expolitionem et vitam longiorem efficiunt. Animadverte: Consuetudines in petitionibus praesto sunt. Features 1.Consistent remotionem rate et vitam longam; 2. Scraches liberat et perficit superficiem superiorem.

Roll polishing. The long lasting product is used to complete the product process and produce consistently superior surface finish. Cleaning: use plenty of DI water to clean the film between each use, then wipe the film with a lint-free wipe. Silicon Carbide Lapping Film Disc Home / Lima lapping politura Disc / Pii Dioxide Lapping Film / Silicon Dioxide Lapping Disc consistit in cinematographico mylar cum resina obductis particulis dioxide pii. Commendatur ad applicationes finales expolitio ubi ora retentionis interest. Commendatur ut jocus colloidalis et pannis pro finali politione in SEM et TEM exempla.Silicon Carbide et Silicon Dioxide cinematographicae cinematographicae mylae lita cum resina continente vel carbide silicone vel particulis dioxide siliconibus. Commendatur denique stridor et applicationes lambentium ubi ora retentionis interest. Features: * Micron gradus premium abrasive ad producendum precise finiatur * Subtilitas tergum pro aequalitate et specimen plana * Aquam resistit, oleum et menstrua maxime * Usus pro non-encapsulated exempla * Non commendatur potentia applicationes ad caput 6" 8" Adscendens: PSA (Pad) Roughness Grade: Mesh cc781905-5cde-3194-bb3b-136bad5cf58d_ c. -bb3b-136bad5cf58d_ Magnitudo particula /µm: 0.3 Type: Silicon Dioxide Disci film lapping

Durable 3D structured lapping film for precise polishing, smoothing, and finishing on metals, glass, ceramics, and other hard surfaces. Cerium Oxide Lapping et Belt 3D membranae structae exemplaria reduplicativa 3D habent ut cubica, pyramis, prismatica, adamas, et sic porro. Continet denique abrasives in medio exemplarium. Haec exemplaria altitudinem uniformem habent, et expolitionem constantem ac durabilem facultatem ostendunt. Features 1. Dura expolitio cum moduli laesura uniformi perficiendi; _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Congruunt remotionem rate cum notis auto-compositis; 3. Obstantia expolitio per striatus inter exemplaria.