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Innovative polycrystalline diamond slurry designed for precise gemstone polishing, delivering superior performance, consistent results, and smooth finishes. PCD Diamond poliendo Slurry Diamond Slurry Polycrystallinus cum PCD Pulvere et aqua/oleum solutum tabellarius liquidus c PCD Slurry altam rate remotionem praebet, minus exasperat, stridor rate stabilis et superficies uniformis poliuntur. Possumus etiam slurriam facere sicut per specifica exigentia a clientibus. Features 1. Pulveris utilitas producta fac ut materia rudis qualitas adhibeatur; 2. Formulae speciales optimam dissipationem servant et rate remotionis altae minus exaspantur; 3. Stabilis stridor rate et uniformis superficies politae obtinetur. Applications 1. Sapphirus materia 2. Hard disk 3. Ferreus tellus 4. signantes anulum

ITO-dedicated LCD panel cleaning flocked pile with precision coating technology. Uniformly disperses aluminum oxide for scratch-free, high-precision cleaning. LCD Panel poliendo Fabric Tabula politurae fabricae constat ex tenuibus abrasivis super basi textilibus obductis. Bona purgatio perficiendi ostendit resinam resinam removendo necnon culletum vitreum cum pro LCD panel processu purgando adhibetur. Features： 1. Praeclara purgatio perficientur._cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Bonorum flexibilitas et pulvinus-effectus cum textili gratiae. Applications： _cc781905-5cde-394-bb3b-136bad5cf58d_ Purgatio tabellae LCD in processu Cellae ante cinematographicum polarizatum adnectitur.

High-precision diamond lapping film discs from HANS. Ideal for polishing glass, metals, ceramics, and semiconductor surfaces with flexible lapping films. Diamond Lapping Film Diamond Lapping pellicula obductis adamantis pulveris praecise gradus in alto robore polyester tergum ut uniformem praebeat, metam constantem. Consistentem, iterabilem metam in durissimis materiis praebet. Praeclaram aciem retentionis praebent, et coplanaritatem conservant quoad varias materias vel duritiem intra specimen. Typice usus est pro transversis sectionis unencapsulatis, TEM cuneum/discrimen consilium poliendi, posterioris poliendi et FIB extenuandi specimen. Available in 0.5-80 µm gradibus, cum vel sine PSA (Pressura sensitiva adhaesiva) gratiae. Mesh cc781905-5cde-3194-bb3b-136bad5cf58d_ c. -bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-b3b-136bad5cf58d_ . -bb3b-136bad5cf58d_ 600 3b-136bad5cf58d_600. -5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_2000 _cc781905-5cde-3194-bb3b-136bad5 cf58d_ 2500 c. 3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_8000 _cc781905-5cde-394-bb3b-136bad5cf58d_ Magnitudo particularis / μm 80 80 80 80 80 5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b-136bad5cf58d -136bad5cf58d_ 40 c. 3194-bb3b-136bad5cf58d_ c. -5cde-3194-bb3b-136bad5cf58d_ 15_cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b-136bad5cf58 d_ cc781905-5cde-394-bb3b-136bad5cf58d_ 9 cc781905-5cde-3194-bb3b-136bad5cf58d_ 9 cc781905-5cde-3194-bb3b-136bad5cf58d_ 9_cc781905-5cde-3194-b3b-136bad5cf58d 3194-bb3b-136bad5cf58d_ 6 _cc781905-5cde-3194-bb3b-136bad5cf58d. c. bb3b-136bad5cf58d_ 2 c.c. 5cde-3194-bb3b-136bad5cf58d_1 -bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Type: Diamond Lapping Film Disc

High-quality polishing film for MPO/MTP multi-fiber connectors, featuring self-sharpening properties to ensure positive core dip and optimal optical performance. Diamond Lapping Film MPO（ Multi-fibra ventilabis On）Fiber Optic connector typus est Plug et Play iungo cum funibus multi- fibris ut signum transmittendi canales, Sic politionem cinematographicam requiret cum proprietate sui acuere, valor Core Dip. affirmativus. Grish SC politio cinematographica specialia pro MPO utilitas efficitur efficiens efficiens ut cinematographica nostra productio technologiam efficiat ut pelliculas nostras tam possibilitatis pellat quam ut multiplicem condicionem poliendi mos occurreret. Features: 1. Slurry cinematographica cinematographica cum strato Uniformi efficiunt in expolitione consistent. c. 2. Aliquam melius se acuere in expolitione _cc781905-5cde-394-bb3b-136bad5cf58d_ 3. Uniformes particulae magnitudo subsidia ad ratem transeuntem altius obtinendam. 5cde-3194-bb3b-136bad5cf58d_ 4. Potest adhiberi ad varias expolitio processus _cc781905-5cde-3194-bb3b-136c. bb3b-136bad5cf58d_ 5. Duo exempla cinematographica alia recipe ut optionis bb3b-136bad5cf58d_

Discover our premium microfinishing film roll, designed for durability and efficiency. Achieve a flawless finish with our microfinishing film roll. Microfinishing film Roll Volumen cinematographicum microfiniens efficiens aequabiliter in alta vi PET cinematographica grana laesura efficiens, quae altam efficientiam praebere potest et exitum speculi effectionis consequi potest. Praesto materiae laesurae sunt aluminii oxydati, carbidi pii et adamantis etc. ad occursum diversae duritiei operis operis finiendi requiruntur. Features _cc781905-5cde-394-bb3b-136bad5cf58d_ 1. Maximum remotionem rate cum grana laesura bene patella; _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Securus radendo et minus obturaculum; 3. Congruentia perficiendi perficiendi cum DELICIAE uniformiter et abrasive patella-upon; 4. Diuturnitatem et bonum sumptus-peractio pro clientibus.

High-precision MTP lapping polishing film from HANS. Ideal for glass, ceramics, metals, and semiconductor polishing with flexible lapping film systems. Diamond Lapping Film MPO（ Multi-fibra ventilabis On）Fiber Optic connector typus est Plug et Play iungo cum funibus multi- fibris ut signum transmittendi canales, Sic politionem cinematographicam requiret cum proprietate sui acuere, valor Core Dip. affirmativus. Grish SC politio cinematographica specialia pro MPO utilitas efficitur efficiens efficiens ut cinematographica nostra productio technologiam efficiat ut pelliculam nostram cinematographicam tantam possibilitatem adveniat ut multiformis condicionis expolitio emptoris occurrat. Features: 1. Slurry cinematographica cinematographica cum strato Uniformi efficiunt in expolitione consistent. c. 2. Aliquam melius se acuere in expolitione _cc781905-5cde-394-bb3b-136bad5cf58d_ 3. Uniformes particulae magnitudo subsidia ad ratem transeuntem altius obtinendam. 5cde-3194-bb3b-136bad5cf58d_ 4. Potest adhiberi ad varias expolitio processus _cc781905-5cde-3194-bb3b-136c. bb3b-136bad5cf58d_ 5. Duo exempla cinematographica alia recipe ut optionis bb3b-136bad5cf58d_

High-performance Rough-Surface Monocrystalline Diamond (RCD) slurry with polydisperse formula for uniform stock removal and scratch-free polishing. Rough-surface MonoCrystalline Diamond Slurry (RCD Slurry) Asperi-superficiem MonoCrystalline Diamond Slurry (RCD Slurry) accipit Hans suam RCD pulverem sicut materias crudas. Cum formula polydispersa, altam et aequabilem remotionem rate servare potest et non facile scalpit producere. RCD slurry adamas maxime adhibetur in molendis et poliendis materia sapphiri, lentis opticis, vitro duro et crystallo, superdura ceramico et mixturae materia etc. Features: 1. Superficies aspera punctum contactum augere potest in processu poliendo; Expolitio igitur effectus auget; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Cum bene se acuere potest, rate remotionem altam servare; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 3. Cum magna vis parvarum secantium mento, asperitatem superficiei fabricae reducere potest. _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_

Flexible Diamond Products Tech Co., Ltd provides high-performance Semiconductor Polishing Slurries for compound semiconductors such as SiC, AlN, GaN, GaAs, and InP. OEM services available for custom polishing solutions, ensuring superior planarity and low-defect surfaces. Semiconductor politurae Slurry Semiconductor poliens Slurry respondet processibus poliendi et consumables pro semiconductoribus compositis, incluso carbide pii, aluminium nitride, gallium nitride, gallium arsenide, indium phosphide, etc., ac etiam varias formas ministerii OEM suscipit. Features GRISH series nova AO slurriae politurae ex professo elaborata est ad expolitionem inP & GaAs Chips. Comparata cum Logitech Slurry, Praecipua lineamenta remotionis rate, planitudinis superficiei melioris (Ra, TTV, LTV); princeps rate. Applications Late usus est in InP Chip et GaAs Chip retro politionem. Suadeo ut tincidunt processus inP & Gaas Logitech Politorem Primus Gradus: Tenuis, 15-30min：3-10umAluminum oxydatum Powder & Quartz Plate； Secundus gradus: Tergum Poloniae30-40min： InP: AO-1/3-20Aluminium oxydatum Polonica Slurry simul cum PU perpolitio Pad GaAs: AO-1/3-20Aluminium oxydatum Polonica Slurry OrAO-1/5-10Aluminium oxydatum poliens Slurry orSO-80-PF CMP Slurry simul cum PU poliendo Pad

Grooved Lapping Film is produced by gravure printing and microstructure repeat technology, coating precision abrasives on the backing to produce concave-convex structure polishing sheet, used to clean chip front panel in the LCD process, have higher polishing cleaning ability and longer life time Diamond Lapping Film Film sulcatus Lapping producitur by gravis impressio et microstructura repetendi technologia, subtilitas abrasiva efficiens in fauore ad structuram concavam-convexam schedam poliendam, adhibita ad scalpturam anterioris tabulae mundandam in processu LCD, altiorem expolitionem habent. purgandi facultatem et longioris vitae tempus. Features 1. Micro-unitates sunt eadem altitudine in superficie producti, molere uniformitatem praestare possunt; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Productum Micro-unitas est pyramidis rectangularis structura, superior purgatio facultatem praestare potest; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 3. Productus micro-unitas facultatem se acuere habet, can_cc781905-5cde-394-bb3b-136bad5cf58d_ firmam facultatem purgandi in vita sua spondet; 3194-bb3b-136bad5cf58d_ 4. Superficies producta uniformiter sulcus chippis distribuit, optimam facultatem chip amotionis praestare potest. _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_

Grinding oil, belonging to a grinding agent. It has the following characteristics: 1) High purity and low ion content; 2) Auxiliary coarse grinding or fine grinding makes the grinding end face more delicate and easier to polish; 3) Good product stability and long storage time. Monocrystalline Diamond Slurry Monocrystallina Diamond Slurry est nostra solutio efficacissima ad durum sinum, ut ceramic, ferrum, materiam metalli, cristallum opticum etc. fundatae sunt in promptu, late ad materias duras lambentes et processus adhibitas. Campus Applications: 1. Sapphirus substernitur stridor et expolitio; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Cadmiae selenide expolitio; Iphone6 camera lens lambens et poliens; capita rigida lambentia et poliuntur; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Metallum lapsu/molendum; aluminium stannum/stridor; fingunt lapping/molere; formare, polire; ceramic stridor/lapping; mobile phone testam/causa lapping; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 4. Pistorius Ring honing.

Professional solutions for LCD panel cleaning. Ensure streak-free, dust-free, and damage-free screens for monitors, TVs, and electronic displays. Silicon Carbide Lapping Film Disc Silicon Dioxide Lapping Disc consistit in cinematographico mylar cum resina obductis particulis dioxide pii. Commendatur ad applicationes finales expolitio ubi ora retentionis interest. Commendatur ut jocus colloidalis et pannis pro finali politione in SEM et TEM exempla.Silicon Carbide et Silicon Dioxide cinematographicae cinematographicae mylae lita cum resina continente vel carbide silicone vel particulis dioxide siliconibus. Commendatur denique stridor et applicationes lambentium ubi ora retentionis interest. Features: * Micron gradus premium abrasive ad producendum precise finiatur * Subtilitas tergum pro aequalitate et specimen plana * Aquam resistit, oleum et menstrua maxime * Usus pro non-encapsulated exempla * Non commendatur potentia applicationes ad caput 6" 8" Adscendens: PSA (Pad) Roughness Grade: Mesh cc781905-5cde-3194-bb3b-136bad5cf58d_ c. -bb3b-136bad5cf58d_ Magnitudo particula /µm: 0.3 Type: Silicon Dioxide Disci film lapping

High-quality flocked pile polishing film for precise surface finishing, smoothing, and polishing on metals, glass, ceramics, and other hard surfaces. Concursus Pile Lapping Film Concursus pilei poliendi pelliculae productae ab provectis technologiae electrostaticae plantationis technologiae et subtilis efficiens technologiae. HS-I grex directe in polyester plantatus est, et separatim adhiberi potest cum liquido poliendo. HS-II fit ex HS I-pii oxydatum laesura obductis. Features: 1. Egregia expolitio facienda: Praeclara expolitio capacitas, effectus expolitio excellens, et post politionem asperitas suerfacii potest attingere effectum speculi gradum; 2. Altus gradus uniformitatis lambentis: productorum superficies est lepida et mollis, altam lapsu constantiam attingere potest, altam aequalitatis et levitatis gradum post lambentem/expolitionem attingere potest; 3. Curviturae serfacei effectus perpoliendi: fructus nostri bonam flexibilitatem habent, varietatem superficiei curivturae expolitio consequi potest, et effectus politionis excellens est; 4. Significant in reservando gulae vitreae effectum vastum, efficaciter evitando scalpendo: fructus nostri utuntur substrati confluentibus electrostaticae, cum elasticitate et gula vitreo/saliorum vastorum subsidiorum et buffering effectuum, cum aqua media expolitio, efficaciter vitare scalpit ad applicandas superficies. .