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Our most popular Polycrystalline Diamond Slurry can provide high stock removal rate without scratches, widely used for the lapping and processing of sapphire substrate, optic lens, hard glasses, crystals, ceramics, magnetic heads, hard disk and CMOS chip etc. Polycrystalline Diamond Slurry Hans adamas slurriam expolitio comprehendit PCD, DND et MD series quae pluribus applicationibus diversis conveniet. Cum bono dispensabilitate, aequaliter particulae magnitudinis distributio, tam aqua quam oleum innixum praesto sunt, late pro duris materiis lambendo et dispensando adhibitis. Polycrystalline Diamond Slurry Nostrae popularis PCD slurry potest praebere altam stirpem remotionem ratem sine fricare, late ad usum laminis et processus sapphiri substrati, lentis optici, vitri duri, crystalli, ceramici, magnetici capita, disco duro et spumae CMOS etc.

High-precision structured diamond thinning pad for glass and sapphire. Ideal for optical lapping, BK7, and fused silica. Made by Hans Diamond, China. Film lambens Taps Home / Lima lapping politura Disc / Diamond Lapping Film Disc / Diamond-bead Polonica Tape facta est ex magnitudine globuli adamantis micron, quae ex multo minore quantitatis micron adamantino constat. Agit sicut lapis micron stridor in processu poliendo, et superficies lenis poliendo cum alto rate remotionis dat. In processu poliendo, globuli adamantis in particulas minores erumpunt, quae tamquam catenam poliunt et constantem expolitionem et vitam longiorem efficiunt. Animadverte: Consuetudines in petitionibus praesto sunt. Features 1.Consistent remotionem rate et vitam longam; 2. Scraches liberat et perficit superficiem superiorem.

High-precision diamond lapping film discs from HANS. Ideal for polishing glass, metals, ceramics, and semiconductor surfaces with flexible lapping films. Diamond Lapping Film Diamond Lapping pellicula obductis adamantis pulveris praecise gradus in alto robore polyester tergum ut uniformem praebeat, metam constantem. Consistentem, iterabilem metam in durissimis materiis praebet. Praeclaram aciem retentionis praebent, et coplanaritatem conservant quoad varias materias vel duritiem intra specimen. Typice usus est pro transversis sectionis unencapsulatis, TEM cuneum/discrimen consilium poliendi, posterioris poliendi et FIB extenuandi specimen. Available in 0.5-80 µm gradibus, cum vel sine PSA (Pressura sensitiva adhaesiva) gratiae. Mesh cc781905-5cde-3194-bb3b-136bad5cf58d_ c. -bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-b3b-136bad5cf58d_ . -bb3b-136bad5cf58d_ 600 3b-136bad5cf58d_600. -5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_2000 _cc781905-5cde-3194-bb3b-136bad5 cf58d_ 2500 c. 3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_8000 _cc781905-5cde-394-bb3b-136bad5cf58d_ Magnitudo particularis / μm 80 80 80 80 80 5cde-3194-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b-136bad5cf58d -136bad5cf58d_ 40 c. 3194-bb3b-136bad5cf58d_ c. -5cde-3194-bb3b-136bad5cf58d_ 15_cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-3194-bb3b-136bad5cf58 d_ cc781905-5cde-394-bb3b-136bad5cf58d_ 9 cc781905-5cde-3194-bb3b-136bad5cf58d_ 9 cc781905-5cde-3194-bb3b-136bad5cf58d_ 9_cc781905-5cde-3194-b3b-136bad5cf58d 3194-bb3b-136bad5cf58d_ 6 _cc781905-5cde-3194-bb3b-136bad5cf58d. c. bb3b-136bad5cf58d_ 2 c.c. 5cde-3194-bb3b-136bad5cf58d_1 -bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Type: Diamond Lapping Film Disc

Discover high-performance diamond lapping films designed for exceptional material removal processes. Ideal for precision grinding tasks. Film lambens Taps Home / Lima lapping politura Disc / Super Resistant diamond lapping Disc / Diamond-bead Polonica Tape facta est ex magnitudine globuli adamantis micron, quae ex multo minore quantitatis micron adamantino constat. Agit sicut lapis micron stridor in processu poliendo, et superficies lenis poliendo cum alto rate remotionis dat. In processu poliendo, globuli adamantis in particulas minores erumpunt, quae tamquam catenam poliunt et constantem expolitionem et vitam longiorem efficiunt. Animadverte: Consuetudines in petitionibus praesto sunt. Features 1.Consistent remotionem rate et vitam longam; 2. Scraches liberat et perficit superficiem superiorem.

High-performance grinding and polishing oil slurry for glass, ceramics, metals, and semiconductors. Compatible with flexible lapping films for ultra-fine finishes. Molendum tincidunt oleum Slurry Molendum oleum pertinens ad stridorem agentis. Habet haec notas: I) Maximum puritatem et humilem ion contentus; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2) Auxiliaris scurrilis stridor aut tenuis stridor facit stridorem faciei subtiliorem et faciliorem politionem; 3) Bonum productum stabilitatis ac diuturnum tempus repositionis. Specificatio: Product mode _cc781905-5cde-394-bb3b-136bad5cf58d_ lPGE-2 Stipare specification 500ml/Bottle（accommodari potest secundum necessitates mos. Repono conditiones: 1) Repono temperies: 0℃~40℃; II) Repono humiditas: 20-70%; 3) Productum commendatur intra 2 annos utendum. Animadverte: Consuetudines in petitionibus praesto sunt. _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Instructiones: 1. Productum immediate vel dilutum aqua deionizata adhiberi potest; 2. Cum hoc productum cum aliis additivis miscens, minutas 4-6, excita; 3. Proponitur hoc productum reddi non debet. _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ Applicationes: 1. Apta ad expolitionem fibrarum opticorum, metallorum, mixturae, subtilitatis machinis opticae, chalybis immaculatae, crystallis et sapphiri praecisio expolitio; 2. Apta ad subtilitatem machinis opticis, crystallis et sapphiris subtilitate poliendis.

Discover an advanced precision cleaning solution for LCD panels. Maintain clarity and protect screens with our cost-effective technology. CF Home / Film lambentes poliendo Tap / CF / CF polire Tape aequabili efficiens aluminium micron-gradum in pulverem oxydorum oxydatum in PET agentem. Ponitur ad attributionem punctum adulando et defectus efficaciter in LCD coloris processu spargendo reparando. Features 1. Superficies vestiens multum uniformis et crassitudo consistent; _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. glabra et recta aciei, 3. Bona munditia.

Discover premium abrasive polishing material solutions for sapphire, ceramic, and glass. Achieve precision, durability, and mirror finishes. Silicon Carbide Lapping Film Disc Silicon Dioxide Lapping Disc consistit in cinematographico mylar cum resina obductis particulis dioxide pii. Commendatur ad applicationes finales expolitio ubi ora retentionis interest. Commendatur ut jocus colloidalis et pannis pro finali politione in SEM et TEM exempla.Silicon Carbide et Silicon Dioxide cinematographicae cinematographicae mylae lita cum resina continente vel carbide silicone vel particulis dioxide siliconibus. Commendatur denique stridor et applicationes lambentium ubi ora retentionis interest. Features: * Micron gradus premium abrasive ad producendum precise finiatur * Subtilitas tergum pro aequalitate et specimen plana * Aquam resistit, oleum et menstrua maxime * Usus pro non-encapsulated exempla * Non commendatur potentia applicationes ad caput 6" 8" Adscendens: PSA (Pad) Roughness Grade: Mesh cc781905-5cde-3194-bb3b-136bad5cf58d_ c. -bb3b-136bad5cf58d_ Magnitudo particula /µm: 0.3 Type: Silicon Dioxide Disci film lapping

Eco-friendly Cerium Oxide polishing slurry provides superior results for aluminum oxide applications, ensuring efficiency and safety. Cerium Oxide Polonica Slurry Series oxydorum cerium slurry politio est genus slurriae environmental amicae aquae substructio expolitio. Materiae laesurae optimae factae, slurria bonam habet dissipationem, magnitudinem frumenti aequabilem et efficaciam altam expolitio. Interim lineamenta quae facilia ad munda et non residuas efficit ut processus MPO/MTP expolitio aptissima. Cerium oxydatum slurry est praemixtum cerium slurry paratum ad expoliendum ius ex utre. Non opus est tuis suggillatis miscere ex pulvere. Recte mixta et facile uti ad obtinendum jejunium, nitidum nitorem in superficiebus vitreis sufficienter prepeditis. Features: 1. Nulla scabere in superficie perpoliendi processum; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Nullus in superficie perpolitus ore fractus est; _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 3. Securus munda et non residua. Instructiones _cc781905-5cde-394-bb3b-136bad5cf58d_ 1. Concutiens lagenam ad redissionem laesurae antequam utatur. _cc781905-5cde-394-bb3b-136bad5cf58d_ _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Pls slurry cum PU seriei expolitio pad.

Discover our premium microfinishing film roll, designed for durability and efficiency. Achieve a flawless finish with our microfinishing film roll. Microfinishing film Roll Volumen cinematographicum microfiniens efficiens aequabiliter in alta vi PET cinematographica grana laesura efficiens, quae altam efficientiam praebere potest et exitum speculi effectionis consequi potest. Praesto materiae laesurae sunt aluminii oxydati, carbidi pii et adamantis etc. ad occursum diversae duritiei operis operis finiendi requiruntur. Features _cc781905-5cde-394-bb3b-136bad5cf58d_ 1. Maximum remotionem rate cum grana laesura bene patella; _cc781905-5cde-394-bb3b-136bad5cf58d_ 2. Securus radendo et minus obturaculum; 3. Congruentia perficiendi perficiendi cum DELICIAE uniformiter et abrasive patella-upon; 4. Diuturnitatem et bonum sumptus-peractio pro clientibus.

Precision diamond-bead polishing tape for optical glass and sapphire. Ideal for flexible lapping, fine finishing, and high-accuracy surface repair. Diamond-bead tincidunt Taps Home / Film lambentes poliendo Tap / Diamond-bead tincidunt Tape / Diamond-bead Polonica Tape facta est ex magnitudine globuli adamantis micron, quae ex multo minore quantitatis micron adamantino constat. Agit sicut lapis micron stridor in processu poliendo, et superficies lenis poliendo cum alto rate remotionis dat. In processu poliendo, globuli adamantis in particulas minores erumpunt, quae tamquam catenam poliunt et constantem expolitionem et vitam longiorem efficiunt. Animadverte: Consuetudines in petitionibus praesto sunt. Features 1.Consistent remotionem rate et vitam longam; 2. Scraches liberat et perficit superficiem superiorem.

Flexible Diamond Products Tech Co., Ltd provides high-performance Semiconductor Polishing Slurries for compound semiconductors such as SiC, AlN, GaN, GaAs, and InP. OEM services available for custom polishing solutions, ensuring superior planarity and low-defect surfaces. Semiconductor politurae Slurry Semiconductor poliens Slurry respondet processibus poliendi et consumables pro semiconductoribus compositis, incluso carbide pii, aluminium nitride, gallium nitride, gallium arsenide, indium phosphide, etc., ac etiam varias formas ministerii OEM suscipit. Features GRISH series nova AO slurriae politurae ex professo elaborata est ad expolitionem inP & GaAs Chips. Comparata cum Logitech Slurry, Praecipua lineamenta remotionis rate, planitudinis superficiei melioris (Ra, TTV, LTV); princeps rate. Applications Late usus est in InP Chip et GaAs Chip retro politionem. Suadeo ut tincidunt processus inP & Gaas Logitech Politorem Primus Gradus: Tenuis, 15-30min：3-10umAluminum oxydatum Powder & Quartz Plate； Secundus gradus: Tergum Poloniae30-40min： InP: AO-1/3-20Aluminium oxydatum Polonica Slurry simul cum PU perpolitio Pad GaAs: AO-1/3-20Aluminium oxydatum Polonica Slurry OrAO-1/5-10Aluminium oxydatum poliens Slurry orSO-80-PF CMP Slurry simul cum PU poliendo Pad

High-purity monocrystalline diamond powder with sharp edges for precision grinding, polishing, and finishing in optical, semiconductor, and industrial applications. Detonation Nano Diamond Pulvis Home / Pulvis lapping / Monocrystalline Diamond Pulvis / Monocrystallinus Diamond pulveris factus est adamas altus per contritionem, effingens, gradatim et alios processus. Monocrystalline Diamond pulveris habet acumen et altum hardness.Features 1. Nanometer et submicron gristae in promptu sunt; 2. Angusta particula magnitudinum distributio consequitur alte lambentem efficientiam et minus inopinatam exasperat; 3. Alta puritas, metalli immunditia minus quam 100ppm.