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Flexible Diamond Products Tech Co., Ltd provides high-performance Semiconductor Polishing Slurries for compound semiconductors such as SiC, AlN, GaN, GaAs, and InP. OEM services available for custom polishing solutions, ensuring superior planarity and low-defect surfaces. Semiconductor Polishing Slurry Semiconductor Polishing Slurry offers a range of polishing processes and consumables specifically designed for compound semiconductors like silicon carbide, aluminum nitride, gallium nitride, gallium arsenide, indium phosphide, and more. Additionally, the company provides various types of OEM services to meet customers' specific needs. One of the latest products from Hans is the new series of AO polishing slurry, which has been professionally developed for back polishing of InP & GaAs Chips. Compared to Logitech Slurry, the AO Polishing slurry offers a high removal rate, better surface flatness (Ra, TTV, LTV), and a high qualification rate. This slurry is widely used in InP Chip and GaAs Chip back polishing , and the recommended polishing process for InP&GaAs Logitech Polisher is as follows: First Step: Thinning, 15-30min: Use 3-10um Aluminum oxide Powder & Quartz Plate. Second Step: Backing polishing , 30-40min: Use InP: AO-1/3-20 Aluminum oxide polishing Slurry together with PU polishing Pad. For GaAs, use AO-1/3-20 Aluminum oxide Polishing Slurry, AO-1/5-10 Aluminum oxide Polishing Slurry, or SO-80-PF CMP Polishing Slurry together with PU polishing Pad. Hans Semiconductor polishing Slurry is a reliable and efficient solution for compound semiconductor polishing , and the company's commitment to providing high-quality products and services makes them a top choice for customers in the industry. Features Hans new series of AO polishing slurry is professionally developed for back polishing of InP & GaAs Chips. Compared to Logitech Slurry, It features high removal rate, better surface flatness (Ra, TTV, LTV), high qualification rate. Applications Widely used in InP Chip and GaAs Chip back polishing . Recommend polishing process for InP&GaAs Logitech Polisher First Step: Thinning, 15-30min：3-10um Aluminum oxide Powder & Quartz Plate； Second Step: Backing polishing ：30-40min： InP: AO-1/3-20 Aluminum oxide polishing Slurry together with PU polishing Pad GaAs: AO-1/3-20 Aluminum oxide Powder polishing Slurry , OrAO-1/5-10 Aluminum oxide polishing Slurry or SO-80-PF CMP polishing Slurry together with PU polishing Pad

We offer abrasive lapping films and papers in sheets, discs, rolls and belts with diamond, aluminum oxide, silicon carbide and cerium oxide coatings in a wide range of particle sizes from mesh size down to sub-micron. FAQ Frequently asked questions General Product Selection Customization Product Use Storage and Handling Application Compatibility How should diamond lapping film be used correctly? To use diamond lapping film correctly, remove a strip from the sheet and securely adhere it to the platen, ensuring precise alignment. Utilize an edge-trailing stroke (up and away) technique, which differs from the approach used with diamond stones. What materials are most effective for diamond lapping applications? Boron carbide is particularly effective for diamond lapping, especially when processing hard materials such as tungsten carbide and tempered steel. Its aggressive cutting action and high material removal efficiency make it suitable for the most demanding applications, including tungsten carbide and titanium carbide. What is the process of diamond lapping? Diamond lapping is a material removal method using fixed diamond abrasive particles which produce long chips of the component material. The process of making chips with a sharp abrasive grain produces the lowest amount of deformation in the component while giving the highest removal rate. Is aluminum oxide better than diamond lapping film? When comparing aluminum oxide to Diamond lapping film for precision polishing, diamond lapping film is generally considered superior. Here are the key reasons why Diamond lapping film is better than aluminum oxide: Superior Hardness: Diamond is the hardest known material, significantly harder than aluminum oxide . This allows Diamond lapping film to cut through materials more efficiently and maintain its cutting ability over a longer period. Higher Cutting Performance: The superior hardness of Diamond translates to higher cutting performance. Diamond particles can cut and abrade materials more quickly and effectively than aluminum oxide , which results in faster material removal rates and more efficient polishing processes. Durability: Diamond lapping film is more durable due to the inherent toughness of Diamond particles. This means the abrasive surface remains effective for a longer period, reducing the need for frequent replacements and thus offering better cost-effectiveness over time. Precision and Consistency: Diamond lapping film provides a more consistent and precise finish. The uniformity of Diamond particles and their ability to maintain sharpness ensures a uniform surface finish, which is crucial in high-precision applications. Versatility: Diamond lapping film can be used on a wider range of materials, including very hard substrates such as ceramics, carbide, and hardened steels. aluminum oxide, while effective, may not perform as well on these tougher materials. Reduction in Surface Damage: The cutting efficiency and sharpness of Diamond particles help in reducing the heat generated during the lapping process, which minimizes the risk of surface damage such as burns or cracks. In summary, Diamond lapping film offers better performance, durability, and precision compared to aluminum oxide, making it the preferred choice for high-precision and demanding polishing tasks. What material is best for lapping? Diamond slurries are often used in precision lapping applications, as they offer several advantages over traditional abrasives such as Alumina or silicon carbide. Diamond particles are harder and more durable than these traditional abrasives, allowing for faster material removal and improved surface finish. How should you choose a diamond lapping fluid for precision finishing? You should choose a diamond lapping fluid that provides stable particle suspension, effective cooling, and consistent lubrication during processing. It should also help reduce residue buildup and support corrosion protection where required. For reliable performance, the fluid concentration should be maintained within the recommended range, and contamination should be monitored regularly. What is the main purpose of the lapping process? The main purpose of the lapping process is to achieve uniformly smooth and flat surfaces on components. This is achieved by selectively removing material from the high points of the surface through controlled interaction with a flat lap plate. What is the standard material removal rate in the lapping process? The lapping process, which is less aggressive than honing, typically removes 0.0005” to 0.005” (0.0127 mm to 0.127 mm) of material. Therefore, the workpiece should be pre-sized as closely as possible to the final dimensions, often through double-disk grinding, before lapping. What is the proper method for cleaning a diamond lapping plate? To clean a diamond lapping plate, evenly apply Bar Keepers Friend using a nylon brush. Gently scrub the plate for one to two minutes, then rinse with warm water while continuing to scrub. Ensure thorough rinsing to remove all residues.

Explore Hans' precision grinding solutions for polished surfaces on metals, glass, and ceramics, enhancing your production quality. About Han Hans is a company that has been operating since June 2001 and specializes in the research and development, production, and operation of ultra-precision grinding and polishing materials, processes, and related equipment. They are committed to providing customers with customized precision grinding and polishing solutions and materials, fully supporting various industries such as semiconductors, optical communications, LED, LCD, automobiles, electronics, micro-motors, medical equipment, and more. The company prides itself on leading sales with technology research and development, and their dedication to this approach has earned them the trust of customers both at home and abroad. Hans has accumulated over 20 years of technology and experience, enabling them to work closely with core customers in the industry. Their technology and service level continue to improve, with many of their products filling gaps in China and reaching the international advanced level. Their products are exported to dozens of countries and regions, such as Germany, the United States, Japan, South Korea, and Italy. The company places a strong emphasis on product stability and consistency, implementing 6S management standards and focusing on on-site improvement. They have also established a complete after-sales service and technical support system to meet and solve customers' high-end needs for ultra-precision grinding and polishing. Lapping films are widely used for polishing various materials, including semiconductor dies, fiber optics, optical components, ceramic capacitors, computer hard drive read-write heads, ceramic seals, and more. The main characteristic of lapping films is that they produce very flat surfaces, especially across materials with a wide range in hardness. Lapping films consist of a polyester backing with an epoxy binder that rigidly fixes the abrasive. The most common abrasives used for lapping films include diamond, silicon carbide, alumina, and ceria. Diamond lapping films are precision coated abrasives that use precisely graded diamond. They provide a tough, durable, tear-resistant abrasive plastic film that is waterproof and resistant to many solvents. Diamond lapping films are exceptional abrasives for preparing microelectronic materials for SEM and TEM analysis. Silicon carbide lapping films are bonded or coated abrasive films of SiC designed to have a large number of cutting points. Alumina lapping films consist of aluminum oxide, which is a naturally occurring material used primarily as a final polishing abrasive because of its high hardness and durability. Silicon dioxide lapping film is recommended for final polishing applications where edge retention is important and is often used as an alternative to colloidals and cloths for final polish on SEM and TEM samples. Cerium oxide lapping film is used for precision cleaning and polishing of components containing glass or quartz and can generate a fine polish on other substrates such as metals, ceramics, and plastics. When compared to 3M lapping film, Allied lapping film, and Norton lapping film, Hans stands out for its commitment to leading sales with technology research and development, providing customers with customized precision grinding and polishing solutions, and establishing a complete after-sales service and technical support system. Their products are also widely trusted by customers both at home and abroad, with many of them reaching the international advanced level.

Premium polycrystalline diamond powder for precision grinding, lapping, and polishing. High hardness, durability, and superior performance for industrial applications. Polycrystalline Diamond Powder The Ultra Fine Polishing Powder is a range of top-quality polishing powders that come in three different types: Silicon Carbide, Aluminum Oxide, and Cerium Oxide. These powders are produced using advanced grading technology that ensures high purity, excellent crystal shape, and uniform particle size distribution. These powders are widely used in various industries such as optics, communications, display, semiconductor, data storage, and many more. They are highly sought-after due to their superior quality and effectiveness in achieving a flawless finish on various surfaces. The Silicon Carbide powder is known for its exceptional hardness and is ideal for polishing hard materials such as metals, ceramics, and glass. The Aluminum Oxide powder is perfect for polishing softer materials such as plastics, rubber, and wood. The Cerium Oxide powder, on the other hand, is best suited for polishing glass and other delicate surfaces. With their superior quality and versatility, the Ultra Fine Polishing Powder is the perfect choice for anyone looking to achieve a perfect finish on any surface. Whether you are a professional in the optics industry or a hobbyist looking to polish your own surfaces, these powders are sure to provide you with the results you desire. Features 1. Fine particle size and adjustable polishing effectiveness can meet various polishing requirements; 2. Centralized particle size distribution and good crystal shape can achieve precision polishing result in short time; 3. High purity can meet the request from magnetic record materials like hard disk, and semiconductor materials like silicon and other high-tech fields. Applications 1. Semiconductor 2. Optical glass & crystal 3. Hard disk 4. LCD panel 5. Optical communication

High-efficiency silicon carbide microfinishing polishing rolls from HANS. Provides mirror finishes and adapts to various hardness substrates with flexible PET backing. Silicon Carbide Lapping Film Roll The Silicon Carbide lapping film boasts a high strength polyester backing that is coated with precisely graded minerals, providing a uniform and consistent finish. The abrasives are oriented and evenly distributed, resulting in a more efficient grinding process and a superior polishing effect. The film contains a variety of minerals, including diamond , aluminum oxide , silicon carbide , silicon oxide , cerium oxide, , making it suitable for grinding and polishing materials of varying hardness. This product is an excellent choice for achieving exceptional results in your polishing and grinding applications. Materials: Silicon Carbide Grit size /D80,D60,D45,D30,D15,D9,D6,D3,D1,D0.5 Backing thickness:125μm(5mil) 75μm(3mil) Product specification: 101.6mm×15m,101.6mm×45m Φ127mm,　Φ203mm(8inch),114mm*114mm(4.5inch),140mm*140mm,152mm*152mm(6inch),228mm*228mm(9inch) special specifications can be customized,back can be with glue and velvet Characters: •perfect grinding efficiency for surface's high-resolution with different precision demand •It not only has the characteristics of high grinding force of fixed abrasive such as grinding wheel, but also can achieve the polishing accuracy of free abrasive such as grinding fluid •It has good strength and flexibility, and can achieve ideal surface polishing effect •Consistent finishing performance •High durability and cost reduction •Available for dry polishing and wet polishing Applications Fiber grinding of ceramic insert core; grinding of optical lens, Lcd and led; grinding of magnetic head and hard disk; grinding of micro motor shaft and micro motor commutator; polishing and griding of tungsten steel and other hard alloy such as printing roller shaft and automobile crankshaft.

High-performance ultra fine polishing powder for precision finishing on glass, metal, ceramics, and semiconductors. Ideal for flexible lapping applications. Ultra Fine Polishing Powder Home / Lapping Polishing Powder / Ultra Fine Polishing Powder / The Ultra Fine Polishing Powder comes in three different variants - Silicon Carbide , Aluminum Oxide , and Cerium Oxide . These variants are produced using advanced grading technology, which ensures that they have high purity, excellent crystal shape, and uniform particle size distribution. These features make them ideal for use in various industries such as optics, communications, display, semiconductor, data storage, and more. The Silicon Carbide variant of the Ultra Fine polishing powder is known for its excellent hardness and wear resistance. It is commonly used for polishing hard materials such as ceramics, glass, and metals. Additionally, it is also used for lapping and grinding applications. The Aluminum Oxide variant of the Ultra Fine polishing powder is known for its high purity and excellent polishing performance. It is commonly used for polishing soft materials such as plastics, rubber, and wood. Additionally, it is also used for surface finishing applications. The Cerium Oxide variant of the Ultra Fine Polishing powder is known for its high polishing efficiency and excellent surface quality. It is commonly used for polishing glass, optics, and semiconductors. Additionally, it is also used for precision polishing applications. Overall, the Ultra Fine polishing powder is a versatile and reliable product that can be used in various industries for different applications. Its advanced grading technology ensures that it has consistent quality and performance, making it a preferred choice for many professionals. Features 1. Fine particle size and adjustable polishing effectiveness can meet various polishing requirements; 2. Centralized particle size distribution and good crystal shape can achieve precision polishing result in short time; 3. High purity can meet the request from magnetic record materials like hard disk, and semiconductor materials like silicon and other high-tech fields. Applications: 1. Semiconductor 2. Optical glass & crystal 3. Hard disk 4. LCD panel 5. Optical communication

High-quality polishing film for MPO/MTP multi-fiber connectors, featuring self-sharpening properties to ensure positive core dip and optimal optical performance. MPO Lapping Film The MPO (Multi-fiber Push On) Fiber Optic connector is a highly efficient Plug and Play connector that utilizes multi-fiber cables as signal transmitting channels. To ensure optimal performance, this connector requires a polishing film with self-sharpening properties, which guarantees a positive Core Dip value. Hans SC has developed a specialized polishing film for MPO connectors, using an advanced coating recipe and leading production technology to create a film that can accommodate a wide range of polishing conditions as per customer requirements. The MPO Grinding Disc Combination Silicon Carbide polishing film is a cutting-edge product that utilizes the latest ultra-precision coating technology. This film is ideal for precision polishing of MPO fiber optic jumpers, metal cores, semiconducting materials, metal rollers, and much more. With its superior performance and durability, this product is a must-have for anyone looking to achieve optimal results in their polishing applications. At Hans SC, we are committed to providing our customers with the highest quality products and services. Our MPO polishing film and Grinding Disc combination are no exception, offering unparalleled performance and reliability. Features: Uniform Slurry Coating: Provides a consistent polishing performance due to the uniform coating layer. Self-Sharpening Properties: Features superior self-sharpening capabilities during polishing , maintaining efficiency. Uniform Particle Size: Ensures a higher passing rate with consistent particle size. Versatile Usage: Suitable for various polishing processes. Multiple Formulations: Available in two different recipe film models to meet specific application needs. Applications: MPO Fiber Optic Connectors: Ideal for the precision polishing of MPO fiber optic jumpers. Metal Cores: Effective in polishing metal cores to a fine finish. Semiconducting Materials: Suitable for precision polishing of semiconductor components. Metal Rollers: Provides excellent results in the polishing of metal rollers and other cylindrical parts. Why Choose Hans SC polishing film : Hans SC is dedicated to providing the highest quality products and services to its customers. The MPO polishing film and Grinding Disc combination are no exceptions, offering unparalleled performance and reliability. Whether you are a telecommunications industry professional or a DIY enthusiast, you can trust Hans SC to deliver the best products to meet your needs. Specifications: Material: Silicon Carbide Coating: Ultra-precision slurry coating Models: Available in two different recipes for varied polishing requirements Compatibility: Suitable for a wide range of polishing conditions and applications

Grooved Lapping Film is produced by gravure printing and microstructure repeat technology, coating precision abrasives on the backing to produce concave-convex structure polishing sheet, used to clean chip front panel in the LCD process, have higher polishing cleaning ability and longer life time Grooved Lapping Film The Grooved Lapping Film is created using advanced gravure printing and microstructure repeat technology. This innovative process involves coating the backing with high-precision abrasives to produce a concave-convex structure polishing sheet. This unique design makes it ideal for cleaning the chip front panel during the LCD process. The Grooved Lapping Film offers superior polishing and cleaning abilities, making it highly effective at removing even the most stubborn stains and blemishes. Additionally, this product has a longer lifespan than other similar products on the market, making it a cost-effective option for businesses looking to save money in the long run. Features: Uniform Micro-Units: Micro-units are of the same height on the surface of the product, ensuring grinding uniformity. Rectangular Pyramid Structure: Product micro-units feature a rectangular pyramid structure, providing higher cleaning ability. Self-Sharpening Ability: Product micro-units possess self-sharpening ability, ensuring stable cleaning performance throughout its lifetime. Chip Groove Distribution: The product surface has uniformly distributed chip Grooves , guaranteeing the best ability for chip removal. Applications: Ideal for cleaning the chip front panel during the LCD process. Suitable for removing stubborn stains and blemishes from various surfaces. Benefits: Ensures uniform grinding with consistent micro-unit height. Provides higher cleaning ability with a rectangular pyramid structure. Maintains stable cleaning performance over the product's lifespan. Offers optimal chip removal with uniformly distributed chip Groove s. Why Choose Grooved Lapping Film : Advanced technology for superior cleaning and polishing results. Extended lifespan for cost-effective usage. Ideal for businesses seeking high-quality, long-lasting solutions. Product Specifications: Technology: Gravure printing and microstructure repeat technology Backing Material: High-precision abrasives-coated backing Surface Structure: Concave-convex structure with chip Groove s Lifespan: Longer than similar products on the market

Eco-friendly aluminum oxide polishing slurry for precision surfaces. Achieve uniform polishing with ultra-fine abrasives. High efficiency. Aluminum Oxide Polishing Slurry Surface Superior Finishing AO polishing slurry is an eco-friendly, water-based polishing liquid that utilizes ultra-fine polishing abrasives to provide a high level of polishing efficiency. The slurry features excellent dispersion and uniform grit sizes, making it ideal for fine polishing of MPO/ MTP aluminum oxide abrasive powders . The alkaline chemistry of Surface Superior Finishing AO polishing slurry , combined with high-purity (>99.99%) alumina powders, makes it the perfect solution for precision polishing of optical materials, electro-optical materials, laser crystals, ophthalmic lenses, and metallurgical specimen preparation. This slurry is typically used in critical polishing applications to achieve surface finishes approaching a few angstroms. It is important to note that the data provided below represents functional particle sizes, which are typically smaller than those measured with standard light scattering metrology. These measurements are indicative of how the particles will behave under pressure during polishing applications. By utilizing Surface Superior Finishing AO polishing slurry , you can achieve a superior level of surface finishing while also reducing your environmental impact. This eco-friendly slurry is an excellent choice for those who are looking for a high-performance polishing solution that is also environmentally responsible. In summary, Surface Superior Finishing AO polishing slurry is a water-based, eco-friendly polishing liquid that utilizes ultra-fine polishing abrasives to provide a high level of polishing efficiency. It is ideal for fine polishing of MPO/MTP aluminum oxide abrasive powders and is perfect for precision polishing of a variety of materials. With its excellent dispersion and uniform grit sizes, this slurry is an excellent choice for critical polishing applications. 1. Finer end-face finishing 2. Rare edge Fraction after polishing 3. Consistent Fiber Height for all ports 4. Easy cleaning for slurry and no residue.

Reach out to Flexible Lapping Film Products for inquiries about polishing, smoothing, and finishing solutions. Expert support for industrial and professional users. Contact Us Thank you for your interest in Hans abrasive Lapping Film. To contact us please reach us via: Submit Thanks for submitting! Address 111th Liuquan Road Zhangdian Zibo Shandong China flexibleabrasive@gmail.com Whatsapp and Tel :+8613805339219

Discover premium CMP slurry for chemical mechanical polishing of materials like wafers and glass. Achieve unmatched precision and efficiency. CMP slurry The CMP slurry is made from colloidal raw materials and is designed with unique formulas that cater to different polishing materials. Our slurry guarantees that the pH value remains almost unchanged during the polishing process, which ensures a stable polishing rate and saves time. Our CMP polishing slurry is widely used for various nanoscale materials' chemical mechanical polishing , including sapphire material , silicon, stainless steel, aluminum magnesium alloy, compound crystal, and more. Our CMP slurry is the ideal solution for achieving high-quality polishing results, thanks to its exceptional performance and stability. The slurry 's unique formula ensures that the pH level remains constant during the polishing process, which helps to maintain a stable polishing rate and significantly reduces the time required for polishing. Our CMP polishing slurry is extensively used in the polishing of nanoscale materials, including sapphire material, silicon, stainless steel, aluminum magnesium alloy, and compound crystal. With our high-quality CMP slurry , you can expect nothing but the best results when it comes to polishing your materials. In conclusion, our CMP slurry is the perfect choice for those who want to achieve high-quality polishing results quickly and efficiently. With its unique formula and exceptional performance, our slurry is the go-to solution for polishing a wide range of nanoscale materials. So why wait? Try our CMP polishing slurry today and experience the difference for yourself! Features 1. Uniform particle size. (narrow distribution, spherical surface); 2. High polishing rate. (special formula. pH value is stable); 3. High flatness. (surface quality Ra<0.2nm TTV<3u); 4. High Cycling life; 5. Low-temperature polishing available. (Under 35℃); 6. Improved type for Silicon Carbide substrate; 7. Neutral or Weak acid polishing slurry for Aluminum Nitride heat dissipation substrate. Applications 1. Silicon carbide substrate 2. Sapphire material 3. Stainless steel 4. Optical glass & crystal 5. Aluminum nitride heat dissipation substrate

Eco-friendly Cerium Oxide polishing slurry provides superior results for aluminum oxide applications, ensuring efficiency and safety. Cerium Oxide Polishing Slurry The Cerium Oxide series polishing slurry is a water-based and environmentally friendly product that is highly effective in polishing. It is made from top-quality abrasive materials, which ensure that the slurry has excellent dispersity, uniform grain size, and high polishing efficiency. Additionally, the easy-to-clean and non-residue features make it ideal for MPO/MTP polishing processes. The Cerium Oxide slurry is a pre-mixed product that is ready to use straight from the bottle. There is no need to mix your own slurries from powder, as this product is already perfectly mixed and easy to use. With this product, achieving a fast and bright polish on your adequately prepped glass surfaces is a breeze. It is important to note that the Cerium Oxide series polishing slurry is a safe and eco-friendly product that is gentle on the environment. With its exceptional polishing capabilities, it is perfect for a wide range of applications, including automotive glass, optical lenses, and LCD screens. Additionally, this product is highly durable and long-lasting, making it a cost-effective solution for all your polishing needs. Features: 1. No scratch on the surface after polishing process; 2. No broken edge on the surface after polishing process; 3. Easy-to-clean and non-residue. Instructions 1. Shaking the bottle to make the abrasive redisperse before using. 2. Pls use slurry with PU series polishing pad.